Direct Maskess Aligner und Laserlithographiegeräte

Stammdaten

Auftraggeber

Walter Schottky Institut / TU München

Veröffentlicht

01.12.2022

Notice-Typ

Ausschreibung

Verfahrensart

Offenes Verfahren

CPV-Code

30232110 — Büromaschinen und Computer

Branche

IT & Digitalisierung

Rechtsgrundlage

EU-Oberschwelle

Beschreibung

Abschnitt I: Öffentlicher Auftraggeber I.1) Name und Adressen: Offizielle Bezeichnung: Walter Schottky Institut / TU München; Nationale Identifikationsnummer: nicht angegeben; Postanschrift: Am Coulombwall 4; Ort: Garching; NUTS-Code: DE212; Postleitzahl: 85748; Land: Deutschland; Kontaktstelle(n): nicht angegeben; Telefon: nicht angegeben; E-Mail: finley@wsi.tum.de; Fax: nicht angegeben; Internet-Adresse(n): Hauptadresse: https://www.wsi.tum.de/; Adresse des Beschafferprofils: nicht angegeben I.2) Gemeinsame Beschaffung: nicht angegeben I.4) Art des öffentlichen Auftraggebers: Einrichtung des öffentlichen Rechts I.5) Haupttätigkeiten: Bildung Abschnitt II: Gegenstand II.1) Umfang der Beschaffung II.1.1) Bezeichnung des Auftrags: Direct Maskess Aligner und Laserlithographiegeräte; Referenznummer der Bekanntmachung: WSI/2022-E24/2 II.1.2) CPV-Code Hauptteil: 30232110; CPV-Code Zusatzteil: II.1.3) Art des Auftrags: Lieferauftrag II.1.4) Kurze Beschreibung: Direct Maskess Aligner und Laserlithographiegeräte, die in den Laboren des Physik Departments der Technischen Universität München installiert werden sollen. Direct Maskess Aligner and Laser Lithoghraphy tools to be installed in the laboratories of the Technical University of Munich. A translation of the entire document into German language is available on request. 1. General system requirements 1.1. Design of the system(s) The desktop and stand-alone maskless laser writers shall be used for contact-free lithography on hybrid (superconducting and semiconducting) quantum circuits and devices, nanofabrication without the need for conventional lithography masks and avoiding all physical contact with delicate quantum devices. Hereby, two instruments that will be used in tandem are required: (i) a table-top system that will be used in combination with a thermolithography system for rapid prototyping and quantum device imaging and repair and provide a resolution of ~1µm and (ii) a stand-alone system that can be used for higher resolution (<0.8µm) rapid, large scale (15cm x 15cm) patterning of large arrays of devices. Both devices shall consist of direct laser lithography units, imaging and autofocus systems that will allow for precise positioning and stitching of multiple lithographic write fields and overlays. The table-top device will be operated within an ISO-4 area of a clean room, while the stand-alone device should be incorporated within an environmental chamber with a filter system providing a stable environment for the system. The system shall be equipped with all components necessary for operation, including controllers, an acoustic/vibration isolation enclosure (if necessary), computer and software, scanning optics. Freight, warranty, installation, and training costs shall be included in the final total. 1.2. Performance specifications of “table-top” system • The system should be delivered with a passive (or better) vibration isolation system and be portable for positioning in different areas of the laboratory. • The system should be delivered with a sample stage system that features linear motors (or equivalent), air bearings, linear encoder position control, and vacuum chuck for various substrate sizes. • The system should be capable of accommodating maximum substrate sizes exceeding 5” x 5” (127mm x 127mm) , minimum substrate sizes below 8 mm x 8 mm and allow write areas exceeding 80 x 80 mm2. • The system should be able to hold substrates with a thickness <200µm (minimum) and a maximum of (at least) 10mm. • The system should feature an overview camera system for alignment to existing structures, an intensity measurement unit for testing and calibrating the dose of the laser beam, a real-time autofocus system with a dynamic range exceeding 150µm, system control electronics for encoders, stage and feature an optical autofocus system. • The spatial resolution of the system should be at least 1µm for the slowest scan speed, increasing at the expense of resolution. • The system should be delivered with all required control electronics, computer control and software allowing DXF and GDSII files to be read into the system and written. • The system should be compatible with broadband and i-line photoresists, including medusa, SU-8. AZ-mOF, TOK IP. • The control computer should be delivered with the system and offer CAD software for on the fly design of writing patterns. 1.3. Performance specifications of “stand alone” system • The system should be entirely contained within an environmental chamber that provides temperature control, laminar flow of clean, filtered air (ISO 5 or better) and a stable operating environment. This environment should provide > 0.25 m / s laminar flow , adjustable up to 0.5 m/s. The temperature stability should be + / - 1C. • The system should be delivered with a passive (or better) vibration isolation system and be portable for positioning in different a II.1.6) Aufteilung des Auftrags in Lose: nein II.2) Beschreibung II.2.1) Bezeichnung des Auftrags: Los-Nr.: entfällt II.2.2) weitere CPV-Codes: nicht angegeben II.2.3) NUTS-Codes: DE21H; Hauptort der Ausführung: Offizielle Bezeichnung: Walter Schottky Institut; Straße; Straße, Hausnummer: Am Coulombwall 4a; Postleitzahl: 85748; Ort: Garching; Land: Deutschland II.2.4) Beschreibung der Beschaffung: Direct Maskess Aligner und Laserlithographiegeräte, die in den Laboren des Physik Departments der Technischen Universität München installiert werden sollen. Direct Maskess Aligner and Laser Lithoghraphy tools to be installed in the laboratories of the Technical University of Munich. A translation of the entire document into German language is available on request. 1. General system requirements 1.1. Design of the system(s) The desktop and stand-alone maskless laser writers shall be used for contact-free lithography on hybrid (superconducting and semiconducting) quantum circuits and devices, nanofabrication without the need for conventional lithography masks and avoiding all physical contact with delicate quantum devices. Hereby, two instruments that will be used in tandem are required: (i) a table-top system that will be used in combination with a thermolithography system for rapid prototyping and quantum device imaging and repair and provide a resolution of ~1µm and (ii) a stand-alone system that can be used for higher resolution (<0.8µm) rapid, large scale (15cm x 15cm) patterning of large arrays of devices. Both devices shall consist of direct laser lithography units, imaging and autofocus systems that will allow for precise positioning and stitching of multiple lithographic write fields and overlays. The table-top device will be operated within an ISO-4 area of a clean room, while the stand-alone device should be incorporated within an environmental chamber with a filter system providing a stable environment for the system. The system shall be equipped with all components necessary for operation, including controllers, an acoustic/vibration isolation enclosure (if necessary), computer and software, scanning optics. Freight, warranty, installation, and training costs shall be included in the final total. 1.2. Performance specifications of “table-top” system • The system should be delivered with a passive (or better) vibration isolation system and be portable for positioning in different areas of the laboratory. • The system should be delivered with a sample stage system that features linear motors (or equivalent), air bearings, linear encoder position control, and vacuum chuck for various substrate sizes. • The system should be capable of accommodating maximum substrate sizes exceeding 5” x 5” (127mm x 127mm) , minimum substrate sizes below 8 mm x 8 mm and allow write areas exceeding 80 x 80 mm2. • The system should be able to hold substrates with a thickness <200µm (minimum) and a maximum of (at least) 10mm. • The system should feature an overview camera system for alignment to existing structures, an intensity measurement unit for testing and calibrating the dose of the laser beam, a real-time autofocus system with a dynamic range exceeding 150µm, system control electronics for encoders, stage and feature an optical autofocus system. • The spatial resolution of the system should be at least 1µm for the slowest scan speed, increasing at the expense of resolution. • The system should be delivered with all required control electronics, computer control and software allowing DXF and GDSII files to be read into the system and written. • The system should be compatible with broadband and i-line photoresists, including medusa, SU-8. AZ-mOF, TOK IP. • The control computer should be delivered with the system and offer CAD software for on the fly design of writing patterns. 1.3. Performance specifications of “stand alone” system • The system should be entirely contained within an environmental chamber that provides temperature control, laminar flow of clean, filtered air (ISO 5 or better) and a stable operating environment. This environment should provide > 0.25 m / s laminar flow , adjustable up to 0.5 m/s. The temperature stability should be + / - 1C. • The system should be delivered with a passive (or better) vibration isolation system and be portable for positioning in different areas of the laboratory. • The system should be delivered with a sample stage system that features linear motors (or equivalent), air bearings, linear encoder position control, and vacuum chuck for various substrate sizes. • The system should be capable of accommodating maximum substrate sizes exceeding 5” x 5” (127mm x 127mm) , minimum substrate sizes ideally below 3 mm x 3 mm and allow write areas exceeding 80 x 80 mm2. • The system should be able to hold substrates with a thickness <200µm (minimum) and a maximum of (at least) 10mm. • The system should feature an overview camera system for coarse alignment to existing structures, an intensity measurement unit for testing and calibrating the dose of the laser beam, a real-time autofocus system with a dynamic range exceeding 150µm, system control electronics for encoders, stage and feature an optical autofocus system. • The system should feature an interferometer that facilitates lateral movement of the substrate with a relative positioning accuracy <20nm. • The spatial resolution of the system should be at least 0.7µm. • The system should be delivered with all required control electronics, computer control and software allowing DXF and GDSII files to be read into the system and written. • The system should feature the possibility to align exposures to structure on the backside of the substrate using a camera under the substrate or similar with an alignment precision of at least 3µm. • The system should be capable of exposing a 4” substrate in < 2 hours. • The system should be compatible with broadband and i-line photoresists, including medusa, SU-8. AZ-mOF, TOK IP. • The control computer should be delivered with the system and offer CAD software for on-the-fly design of writing patterns. 2. Delivery and acceptance test 2.1. Delivery date, installation & training The system must be delivered within 6 months after receipt of the order and pass the acceptance test at the TUM. The total price must include delivery / freight, installation costs, VAT, training costs, and warranty. At least 2 employees of the TUM should be trained in the use of each of the systems. 2.2. Warranty The system must include a warranty of 12 months from successful completion of the acceptance test against all faults and failures provided by the supplier or manufacturer. 2.3. Acceptance test Following installation at the target laboratories of the TUM, both systems shall be tested by a technician from the supplier accompanied by an employee of the TUM. In the test, all listed specifications and features shall be fulfilled and demonstrated. II.2.5) Zuschlagskriterien: Die nachstehenden Kriterien: Preis II.2.11) Angaben zu Optionen: Optionen: nein II.2.13) Angaben zu Mitteln der Europäischen Union: Der Auftrag steht in Verbindung mit einem Vorhaben und/oder Programm, das aus Mitteln der EU finanziert wird: nein; Projektnummer oder -referenz: II.2.14 Zusätzliche Angaben: Abschnitt IV Verfahren IV.1) Beschreibung IV.1.1) Verfahrensart: Offenes Verfahren. Beschleunigtes Verfahren: nein IV.1.3) Angaben zur Rahmenvereinbarung oder zum dynamischen Beschaffungssystem: nicht angegeben. IV.1.6) Angaben zur elektronischen Auktion: nicht angegeben; IV.1.8) Angaben zum Beschaffungsübereinkommen (GPA): Der Auftrag fällt unter das Beschaffungsübereinkommen: nein IV.2) Verwaltungsangaben IV.2.1) Frühere Bekanntmachung zu diesem Verfahren: Bekanntmachungsnummer im EU-Amtsblatt: 2022/S 199-562233 IV.2.8) Angaben zur Beendigung des dynamischen Beschaffungssystems: nicht angegeben IV.2.9) Angaben zur Beendigung des Aufrufs zum Wettbewerb in Form einer Vorinformation: nicht angegeben Abschnitt V Auftragsvergabe Auftrags-Nr.: 2648105 Los-Nr.: entfällt Bezeichnung des Auftrags: Direct Maskess Aligner und Laserlithographiegeräte V.1) Information über die Nichtvergabe Der Auftrag/Das Los wird nicht vergeben; Sonstige Gründe (Einstellung des Verfahrens) Abschnitt VI Weitere Angaben VI.3) Zusätzliche Angaben: es wurde nur ein Angebot abgegeben VI.4) Rechtsbehelfsverfahren/Nachprüfungsverfahren VI.4.1) Zuständige Stelle für Rechtsbehelfs-/Nachprüfungsverfahren: Offizielle Bezeichnung: Regierung von OBB; Postanschrift: nicht angegeben; Ort: München; Postleitzahl: nicht angegeben; Land: Deutschland; E-Mail: vergabekammer.suedbayern@reg-ob.bayern.de; Telefon: nicht angegeben; Internet-Adresse: nicht angegeben; Fax: nicht angegeben VI.4.2) Zuständige Stelle für Schlichtungsverfahren: Offizielle Bezeichnung: Regierung von OBB; Postanschrift: nicht angegeben; Ort: München; Postleitzahl: nicht angegeben; Land: Deutschland; E-Mail: vergabekammer.suedbayern@reg-ob.bayern.de; Telefon: nicht angegeben; Internet-Adresse: nicht angegeben; Fax: nicht angegeben VI.4.3) Einlegung von Rechtsbehelfen: Genaue Angaben zu den Fristen für die Einlegung von Rechtsbehelfen: VI.4.4) Stelle, die Auskünfte über die Einlegung von Rechtsbehelfen erteilt: Offizielle Bezeichnung: Regierung von OBB; Postanschrift: nicht angegeben; Ort: München; Postleitzahl: nicht angegeben; Land: Deutschland; E-Mail: vergabekammer.suedbayern@reg-ob.bayern.de; Telefon: nicht angegeben; Internet-Adresse: nicht angegeben; Fax: nicht angegeben VI.5) Tag der Absendung dieser Bekanntmachung: 28.11.2022 Hardware

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