Resist-Simulations-Software

The subject of this tender is a software for the simulation of the imaging process in optical micro-lithography. The soft- ware shall be modular so that different aspects of the imaging of microstructures in photoresist can be considered. De- pending on the requirements, the simulations will be performed in 2D for the aerial image or in 3D for the intensity distri- bution in the photoresist (bulk image) and the corresponding resist profile after development. By varying the input pa- rameters of the simulations such as exposure dose and focus or the layer thickness of photoresist and antireflection coat-ing (ARC), the process windows and optimal process parameters or layer thicknesses can be determined by displaying the results in e.g. bossing plots or swing curves. Furthermore, it should be possible to automatically optimize limited areas of mask layouts using a model-based optical near-field correction (model-based OPC) in order to achieve a higher imaging fidelity. Resist-Simulations-Software